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AX5000 HPM Plasma Reactor
The Model AX5000 is a microwave plasma reactor that includes reactor assembly and microwave related power supply, circulator, dummy load and three-stub tuner. The Model AX5200 is a complete system combining the basic reactor AX5000 with vacuum control and process gas supply. Two optional electromagnets can be used as a divergent files electro cyclotron resonance (ECR) source for operation at low pressures and low temperatures. A range of heated and cooled substrate holders and a choice of ASTeX microwave generators are available.

 

 

 

  • High quality CVD diamond films for a wide variety of applications.
  • Flexible reactor design supports high pressure microwave and magnetized microwave CVD
  • Development time minimized with supplied CVD diamond process recipes
  • Reliable, stable, reproducible, versatile operation
  • Modular approach to suit a wide range of budgets
  • Extensive after-sales support

 

» View Model AX5000 Applications
Microwave Plasma Products

Model AX5000/5200 + AX6300 (ECR)
AX5000 includes reactor assembly, power supply, circulator, dummy load and three-stub tuner. AX5200 system combines reactor with vacuum control and process gas supply.

Model AX5250/AX5400 (5 kW)
AX5250 reactor incorporates 5 kW at 2.45 GHz generator. AX5400 system combines reactor with vacuum control and process gas supply.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment. AX6560 is a turnkey system, suited for robotic tool handling.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010-INTAX5010-INT Microwave Plasma CVD System
The AX5010-INT Microwave Plasma CVD System is used for growth of high quality diamond films and is designed
as a low cost entry system for basic film research.