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AX5200 1.5kW Integration Model
The AX5250 microwave plasma reactor incorporates 5 kW at 2.45 GHz microwave generator to produce plasmas at high power densities. Such operation allows a new regime of plasma chemistries. In this microwave cavity configuration, liner growth rates on axis up to 15micro meter mm/hour for diamond have been demonstrated. Total mass deposition rates of 60mg/hour have been achieved. The process recipe for thick, high growth rate films is included with the system. The Model AX5400 is a complete system combining the basic reactor AX5250 with vacuum control and process gas supply.




  • Film or thick CVD diamond at deposition rates up to 15micro meter mm/hour
  • "White" transparent diamond at growth rates up to 2 to 5micro meter mm/hour
  • Accommodates substrates up to 4 inch diameter
  • Produces CVD diamond with high thermal conductivity - 10 to 20 W/cm-K
  • Operation at 10 to 100 Torr (1 to 100 Torr optional)
  • Fully automated for CVD diamond growth for multi-recipe, multi-day operation
Comparison between 1.5kW and 5kW microwave diamond CVD
Microwave Power
1.5kW
5kW
Appropriate applications Semiconductor device (doping), Homo& Hetero epitaxial films, FED* Thermo management (Heat Sink), Optical, Tools coating, FED*, SAW filters**
Typical Growth rate 0.1 - 0.5 or 1 micron/hr 2 - 5 or 6 micron/hr
Substrate Stage Heating Stage Water Cooled Stage
Substrate Temp. Control Digital Setting Need shim replacement
BEN*** OK OK
Grain Size Small Small - large
Sample size 50mm (2 inch)±15% uniformity (Guaranteed) 50mm (2 inch) ±15% uniformity (Guaranteed)
Accommodating substrate 90mm (<4 inch) 100mm (4 inch)
Stage Option: No Yes (changeable to heating stage)
   
*  
 Field Emission Display
**  
 Surface Acoustic Wave
***  
 Biased Enhanced Nucleation


» View Model AX5250 Applications

 

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Microwave Plasma Products

Model AX5000/5200 + AX6300 (ECR)
AX5000 includes reactor assembly, power supply, circulator, dummy load and three-stub tuner. AX5200 system combines reactor with vacuum control and process gas supply.

Model AX5250/AX5400 (5 kW)
AX5250 reactor incorporates 5 kW at 2.45 GHz generator. AX5400 system combines reactor with vacuum control and process gas supply.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment. AX6560 is a turnkey system, suited for robotic tool handling.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010-INTAX5010-INT Microwave Plasma CVD System
The AX5010-INT Microwave Plasma CVD System is used for growth of high quality diamond films and is designed
as a low cost entry system for basic film research.