HOME  |  SITE MAP
 
MICROWAVE PLASMA CVD SYSTEMS
Overview | Microwave Plasma Reactors | Microwave Plasma Applications | Microwave Plasma Literature | Bibliography
Model AX6600 High Power, for production
The AX6600 microwave plasma system is designed to operate with plasmas at high power densities for large area, high deposition rate processes to meet the scale-up needs of diamond coated tool insert manufacturers. This complete turnkey system incorporates the latest microwave technology with computer control for ease of use. A large batch size, covering an area of 8 inches in diameter, can be processed at one time. It is a highly flexible design which can be operated in a wide range of power from 35 kW to 100 kW.

In the year 2000, Seki Technotron delivered its first turnkey production system with 60 kW microwave powered plasma.

  • Large throughput
  • Easy to use
  • Production capability
  • Computer-controlled, turnkey operation
  • Reliable, stable reproducible,versatile operation
  • Extensive after-sales process support and training

 

» View Model AX6600 Applications
Microwave Plasma Products

AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010-INTAX5010-INT Microwave Plasma CVD System
The AX5010-INT Microwave Plasma CVD System is used for growth of high quality diamond films and is designed
as a low cost entry system for basic film research.