| Specifications of Microwave Plasma Reactor Models
| Source Model |
|
AX5000 |
|
AX5400 |
|
— |
|
— |
| |
| Integration Model |
|
AX5200 |
|
AX5250 |
|
— |
|
— |
|
| System Model |
|
AX6300 |
|
AX6350 |
|
AX6550/6560 |
|
AX6600 |
| Reactor Type |
|
Plasma Immersion |
|
Plasma Immersion |
|
Plasma Immersion |
|
Plasma Immersion |
| Use |
|
R&D |
|
R&D |
|
Production |
|
Production |
| Year of Initial Sale |
|
1988 |
|
1992 |
|
1993 |
|
1998 |
Stage Heated
or Cooled |
|
Heated |
|
Cooled |
|
Cooled |
|
Cooled |
| Microwave Power |
|
1.5kW |
|
5kW |
|
8kW |
|
60 - 100kW |
| Microwave Frequency |
|
2.45GHz |
|
2.45GHz |
|
2.45GHz |
|
915MHz |
| Typical Diameter |
|
50mm |
|
50mm |
|
64mm dia. Thermal |
|
200mm |
| |
|
|
|
|
|
100mm dia. Tools |
|
|
| Max Diameter |
|
100mm |
|
100mm |
|
125mm |
|
300mm |
| Typical Growth Rate |
|
0.1-0.5micro meter g/hr |
|
up to 7micro meter m/hr |
|
up to 7micro meter m/hr |
|
up to 15micro meter m/hr |
| Typical Mass Rate |
|
1-4mg/hr |
|
60mg/hr |
|
90mg/hr |
|
1g/hr |
|
Seki Diamond Systems is the leading supplier of Microwave Plasma CVD Systems for Diamond research
and production worldwide. 
New System and Process for High Quality Diamond Deposition.
The NCS 3-150 is a revolutionary new MW Plasma CVD deposition system for low temperature diamond and related carbon films.
This system enables poly crystalline
diamond compatible thin film
growth over a very broad range
of materials for device integration,
biocompatible coatings and
other advanced applications.