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W&L
Low Temperature CVD Systems

Ideal for substrates requiring lower temp deposition

 

  • Microwave plasma linear antenna systems
  • Low-temperature poly diamond deposition (<400°C)
  • For glass, polymers and other substrates requiring lower temps
  • Scalable for large substrates and moving web: 1 meter wide by multiple meter depth
  • Small system available for R&D (<8” diameter)

 

Applications

  • Thermal Management
  • MEMS
  • Active Devices
  • Wear Parts
  • Biocompatible Coatings
  • Detectors
  • Electrodes

 

  • Microcrystalline
  • Nanocrystalline
  • Homoepitaxy
  • Doped Films
  • Hydrogenation
  • Oxidation
  • Graphene

 

As the quality of diamond thin films has steadily improved over the years, the number of innovative applications has now been dramatically increased by the capability of depositing homogenous and dense nano crystalline diamond films at lower temperatures — from 300 to 400°C as opposed to ~1,000°C.

The NCS 3-150 from W&L Coating Systems is an advanced microwave plasma CVD deposition system for low-temperature growth of diamond and graphene-based films. This system enables poly crystalline diamond compatible thin film growth over a very broad range of materials for device integration, bio-compatible coatings and other advanced applications.

W&L coating systems utilize linear coaxial antenna technology for sustaining the discharges with microwave power. Supplying pulsed power rather than continuous waves provides high chemical conversion rates while reducing the heat load on the substrate. Substrate temperature is independently controlled by infrared heaters and gas cooling. Thermocouple, heater, cooler and a molybdenum substrate stage encapsulated by stainless steel sheets are mounted on a z-axis stage which can also rotate if required.

For detailed product information and suggested configurations/options for specific diamond synthesis applications please contact us.

Download W&L brochure