Microwave Plasma CVD Systems
from Seki Diamond
A range of systems — entry-level R&D to full production applications
Seki Diamond Systems has long been the world’s leading supplier of microwave plasma CVD diamond systems. Since acquiring ASteX’s technology in 1999, Seki Diamond has enhanced and expanded the product line and delivered hundreds of advanced diamond deposition systems worldwide. Seki Diamond now offers the industry’s broadest selection of standard and custom systems and process solutions for diamond and advanced carbon material synthesis, serving a spectrum of applications.
Seki Diamond systems deliver the highest quality microwave plasma CVD diamond films and highest growth rates available in the industry. They are respected for their exceptional reliability, process flexibility, repeatability and vacuum integrity, giving superior performance even for the most demanding applications.
Number one choice of the world’s leading diamond researchers
Diamond scientists consistently choose Seki Diamond systems, to shorten their process development times on microwave plasma CVD diamond and also to leverage the consistency with other diamond specialists and their published research worldwide. Seki Diamond systems are presently in use at most of the world’s leading research centers, including Carnegie, NRL, CEA Saclay, Hasselt, UCL, CNRS, U. Munich, MSU, Vanderbilt, AIST NIMS, NCSU, UCSB, Aston, Cardiff, Stanford, Monash, Melbourne, Harvard, Wisconsin, Texas Tech, Louisville, Waterloo, MIT and many more…
Seki Diamond now has the world’s largest installed base of diamond R&D systems, with more than 80% share of market at university, government and corporate labs — as well as the largest base of commercial microwave CVD systems producing gems, tools and electronic products.
Major Seki Diamond advantages
- High-purity diamond
- High growth rate
- Precise doping control
- Excellent process stability & repeatability
- High reliability
- Wide-range process control
References for MRS Bulletin images above:
1. G. Bogdan, K. De Corte, W. Deferme, K. Haenen, M. Nesládek, Phys. Status Solidi A 203, 3063 (2006).
2. K. Haenen, A. Lazea, M. Nesládek, S. Koizumi, Phys. Status Solidi (Rapid Research Letters) 3, 208 (2009).
3. A. Lazea, V. Mortet, J. D’Haen, P. Geithner, J. Ristein, M. D’Olieslaeger, K. Haenen, Chem. Phys. Lett. 454, 310 (2008).
4. O.A. Williams, M. Daenen, J. D’Haen, K. Haenen, M. Nesládek, D.M. Gruen, Diam. Relat. Mater. 15, 654 (2006).
5. S. Heyer, W. Janssen, S. Turner, Y.-G. Lu, W.S. Yeap, J. Verbeeck, K. Haenen, A. Krueger, ACS Nano (2014), doi 10.1021/nn500573x.